| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pellicle and an exposure device capable of inspecting transparent foreign objects on the pellicle with a mask stage of the exposure device masked. <P>SOLUTION: With a pellicle frame 52 of a pellicle 50 equipped with a surface acoustic wave element 20A which generates a surface acoustic wave propagating on the surface of a pellicle film 51 and a surface acoustic wave element 20B which receives the surface acoustic wave, the surface acoustic wave detects the presence/absence of a foreign object on the pellicle film 51. This foreign object inspection is made with a photomask 1 having the pellicle 50 mounted on a mask stage 103 of an exposure device 100. With a plurality of pairs of the surface acoustic wave elements 20A, 20B provided on the pellicle frame 52, the location of the foreign object on the pellicle film 51 can be specified. <P>COPYRIGHT: (C)2012,JPO&INPIT |
