| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To cancel uneven beam for lithography, relating to a lithography method and a lithography apparatus using a plurality of variably shaped electron beams generated using first and second shaping opening plates where a plurality of openings are provided. <P>SOLUTION: In an electron beam lithography method, a plurality of openings are provided at first and second shaping opening plates respectively, a plurality of electron beams which have passed through the plurality of openings of the first shaping opening plate are focused at an opening part corresponding to the second shaping opening plate, while a plurality of shaped electron beams that have passed through the plurality of openings of the second shaping opening plate are shot on a material for lithography. The graphics drawn with the shots of the plurality of shaped electron beams are drawn with multiple, at least twice, shots of shaped electron beams having the same shape and cross section area. At least the two shots are performed with the electron beams shaped using different openings of the first shaping opening plate. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
