发明名称 |
Thin film transistor and thin film transistor array panel including the same |
摘要 |
A thin film transistor includes: a gate electrode on a substrate; a source electrode; a drain electrode positioned in a same layer as the source electrode and facing the source electrode; an oxide semiconductor layer positioned between the gate electrode and the source electrode or drain electrode; and a gate insulating layer positioned between the gate electrode and the source electrode or drain electrode. The oxide semiconductor layer includes titanium oxide (TiOx) doped with niobium (Nb). |
申请公布号 |
US8957415(B2) |
申请公布日期 |
2015.02.17 |
申请号 |
US201213664180 |
申请日期 |
2012.10.30 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Ahn Byung Du;Lim Jun Hyung;Park Jin Seong |
分类号 |
H01L29/12 |
主分类号 |
H01L29/12 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP |
主权项 |
1. A thin film transistor comprising:
a gate electrode on a substrate; a source electrode on the gate electrode; a drain electrode at a same layer as the source electrode, and spaced apart from and facing the source electrode; an oxide semiconductor layer between the gate electrode and the source electrode or between the gate electrode and the drain electrode; and a gate insulating layer between the gate electrode and the source electrode or between the gate electrode and the drain electrode, wherein the oxide semiconductor layer comprises a continuous layer of amorphous titanium oxide doped with niobium. |
地址 |
KR |