发明名称 Thin film transistor and thin film transistor array panel including the same
摘要 A thin film transistor includes: a gate electrode on a substrate; a source electrode; a drain electrode positioned in a same layer as the source electrode and facing the source electrode; an oxide semiconductor layer positioned between the gate electrode and the source electrode or drain electrode; and a gate insulating layer positioned between the gate electrode and the source electrode or drain electrode. The oxide semiconductor layer includes titanium oxide (TiOx) doped with niobium (Nb).
申请公布号 US8957415(B2) 申请公布日期 2015.02.17
申请号 US201213664180 申请日期 2012.10.30
申请人 Samsung Display Co., Ltd. 发明人 Ahn Byung Du;Lim Jun Hyung;Park Jin Seong
分类号 H01L29/12 主分类号 H01L29/12
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A thin film transistor comprising: a gate electrode on a substrate; a source electrode on the gate electrode; a drain electrode at a same layer as the source electrode, and spaced apart from and facing the source electrode; an oxide semiconductor layer between the gate electrode and the source electrode or between the gate electrode and the drain electrode; and a gate insulating layer between the gate electrode and the source electrode or between the gate electrode and the drain electrode, wherein the oxide semiconductor layer comprises a continuous layer of amorphous titanium oxide doped with niobium.
地址 KR