| 发明名称 | Treatment liquid for inhibiting pattern collapse in microstructure and method of manufacturing microstructure using the same | ||
| 摘要 | The objects of the present invention are to provide a treatment liquid able to inhibit pattern collapse in a microstructure such as a semiconductor device or a micromachine, as well as a method of manufacturing a microstructure using the same.;Means to solve the problems is to treat a microstructure with a treatment liquid for inhibiting pattern collapse in a metal microstructure comprising an alkylphosphonic acid or salt thereof in which said alkyl moiety contains 6 to 18 carbon atoms, water, and a water soluble solvent. | ||
| 申请公布号 | US8956462(B2) | 申请公布日期 | 2015.02.17 |
| 申请号 | US201313799522 | 申请日期 | 2013.03.13 |
| 申请人 | Mitsubishi Gas Chemical Company, Inc. | 发明人 | Matsunaga Hiroshi;Aoyama Kimihiro |
| 分类号 | C11D3/36;C11D3/43;C11D7/36;H01L21/02;H01L21/06;C09D7/12;H01L21/033;H01L21/311 | 主分类号 | C11D3/36 |
| 代理机构 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A treatment liquid for inhibiting pattern collapse in a metal microstructure comprising an alkylphosphonic acid or salt thereof in which said alkyl moiety contains 10 to 16 carbon atoms; water; and a glycol of the following formula (1) or (2): HO(C2H4O)nR1 (1) HO(C3H6O)mR1 (2) wherein R1 denotes a hydrogen atom or a C1-C4 alkyl group, n denotes an integer of 2 to 4, and m denotes an integer of 1 to 3; wherein the content of the alkylphosphonic acid is 5 ppm to 800 ppm. | ||
| 地址 | Chiyoda-ku JP | ||