| 摘要 |
<p>Disclosed is a manufacturing method for a laser-reflective mask. The manufacturing method for a laser-reflective mask according to an aspect of the present invention comprises the steps of: forming a photoresist layer on top of a base substrate; forming a photoresist layer pattern with a photoresist layer groove by pattering in a reflection region for a laser beam on the base substrate; forming a reflective layer on the photoresist layer groove and the photoresist layer pattern; forming a crack on the photoresist layer pattern; and forming a reflective layer pattern by using the crack formed on the photoresist layer pattern to remove the photoresist layer pattern and the reflective layer formed on the upper part of the photoresist layer pattern.</p> |
