发明名称 MULTILAYER STRUCTURE METAL MASK, AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a multilayer structure metal mask having high hardness and small elongation, and causing a small board thickness difference between a printing pattern part and an area excluding the part.SOLUTION: A multilayer structure metal mask includes: a ground layer 1 comprising a minute crystal coating of a board thickness of equal to or less than 1μm; a first high hardness glossy plated layer 2 of a board thickness of 5-10μm, preventing the opening periphery from slackening onto the ground layer; a first minute crystal coating layer 3 of a board thickness of about 4-10μm, equal to or slightly thickened or thinned than the first high hardness glossy plated layer on the first high hardness glossy plated layer; a second high hardness glossy plated layer 7 of a board thickness of equal to or less than 10μm, preventing the opening periphery from slackening onto the first minute crystal coating layer; a second minute crystal coating layer 8 of a board thickness of about 4-18μm, equal to or slightly thickened or thinned than the second high hardness glossy plated layer on the second high hardness glossy plated layer; and an ultrathin high hardness glossy plated layer 9 as finger print adhesion prevention on the second minute crystal coating layer.</p>
申请公布号 JP2015030162(A) 申请公布日期 2015.02.16
申请号 JP20130160341 申请日期 2013.08.01
申请人 BONMAAKU:KK 发明人 TAKEI KEISUKE
分类号 B41N1/24;B41C1/14;C25D3/12;C25D5/14;C25D7/00 主分类号 B41N1/24
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