| 摘要 |
本发明提出一种发光二极体基板的制作方法。此方法包括下列步骤：提供一奈米图案化基板，奈米图案化基板之图案包括有彼此间隔的复数凸部及复数具有深度d1之第一凹部；形成复数保护结构包覆每一凸部，并裸露出每一第一凹部的表面；施加一非等向性蚀刻处理，使未被保护结构包覆之每一第一凹部的表面进一步被蚀刻，形成复数深度d2之第二凹部，且d2>d1。; forming a plurality of protection structures to cover each convex portion, and exposing a bottom surface of each first concave portion; applying an anisotropic etching procedure to etch the bottom surface of each first concave portion which is not covered by the protection structure, in order to form a plurality of second convex portions with depth d2. The depth d2 is deeper than d1. |
