| 摘要 |
PROBLEM TO BE SOLVED: To form a predetermined pattern on a substrate, in substrate processing using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer.SOLUTION: An ultraviolet ray irradiator for reforming a resist pattern, formed on the surface of a wafer W, by irradiating with an ultraviolet ray has a worktable 140 for suction holding the wafer W, a light source section 141 for irradiating the wafer W suction held on the worktable 140 with an ultraviolet ray, and a piezoelectric element 161 for partially adjusting the distance between the wafer W and the light source section 141, by partially pressing the wafer W held on the worktable 140. |
