| 摘要 |
<p>The present invention relates to a composition for washing a semiconductor wafer and, more specifically, a composition for washing a semiconductor wafer, which includes a quaternary ammonium hydroxide; a non-ion surfactant denoted by chemical formula 1; and an organic acid and an inorganic acid or salt thereof and accordingly improves a washing effect, thereby manufacturing a semiconductor device with a high yield and a good element property.</p> |
