发明名称 |
FOCUSED ION BEAM DEVICE, FOCUSED ION/ELECTRON BEAM PROCESSING OBSERVATION DEVICE, AND SAMPLE PROCESSING METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To achieve a focused ion beam with a small beam diameter even at a low acceleration voltage without using a complicated device configuration, thereby reducing damage on a sample.SOLUTION: The present invention relates to, for example, a focused ion beam device configured to focus ion beams from an ion source through a lens to irradiate a sample with focused ion beams. In the focused ion beam device, a four-pole element lens is arranged between an extraction electrode for extracting the ion beams from the ion source and an acceleration electrode for accelerating the ion beams.</p> |
申请公布号 |
JP2015032380(A) |
申请公布日期 |
2015.02.16 |
申请号 |
JP20130159447 |
申请日期 |
2013.07.31 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
KUBO TAKEHIRO;MADOKORO YUICHI |
分类号 |
H01J37/317 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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