发明名称 FOCUSED ION BEAM DEVICE, FOCUSED ION/ELECTRON BEAM PROCESSING OBSERVATION DEVICE, AND SAMPLE PROCESSING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To achieve a focused ion beam with a small beam diameter even at a low acceleration voltage without using a complicated device configuration, thereby reducing damage on a sample.SOLUTION: The present invention relates to, for example, a focused ion beam device configured to focus ion beams from an ion source through a lens to irradiate a sample with focused ion beams. In the focused ion beam device, a four-pole element lens is arranged between an extraction electrode for extracting the ion beams from the ion source and an acceleration electrode for accelerating the ion beams.</p>
申请公布号 JP2015032380(A) 申请公布日期 2015.02.16
申请号 JP20130159447 申请日期 2013.07.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KUBO TAKEHIRO;MADOKORO YUICHI
分类号 H01J37/317 主分类号 H01J37/317
代理机构 代理人
主权项
地址