| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam vapor deposition device that prevents both incidence of secondary electrons and reflected electrons generated in electron beam vapor deposition on a substrate and obstruction to vapor deposition by a magnet for electron shielding itself as a shield.SOLUTION: A storage container (crucible 2) for vapor deposition material is positioned below a substrate 1 as an object of vapor deposition, and a pair of magnets 4 are arranged in an upper space in a direction from the center of the storage container to the center of the substrate 1 at a predetermined interval across the center of the storage container such that a substrate center-side end of each of the pair of magnets 4 is inclined below the other end. Consequently, an organic device is prevented from deteriorating in characteristics when an organic thin film formed on a substrate in advance is irradiated with reflected electrons and secondary electrons generated in the electron beam vapor deposition simultaneously with the electron beam vapor deposition, and the same characteristics with an organic device manufactured by resistance heating type metal vapor deposition can be obtained. Further, this mechanism itself is never an obstacle to the vapor deposition, which can be achieved over the entire region of the substrate. |
