发明名称 DISCHARGE AUXILIARY TYPE LASER HOLE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an open hole formation method in a glass substrate hardly generating necking in the open hole, and hardly generating a crack on an open hole formation position.SOLUTION: In a discharge auxiliary type laser hole processing method, an open hole is formed in a glass substrate by laser light irradiation, and the shape of the open hole is adjusted by a discharge phenomenon through the open hole. In the discharge auxiliary type laser hole processing method, COlaser having a wavelength of 9.3 μm or 9.6 μm is used as laser light.
申请公布号 JP2015030016(A) 申请公布日期 2015.02.16
申请号 JP20130162051 申请日期 2013.08.05
申请人 ASAHI GLASS CO LTD 发明人 ONO MOTOJI
分类号 B23K26/382;B23H7/38;B23H9/14;B23K26/40 主分类号 B23K26/382
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