| 摘要 |
<p>A transparent conductive substrate according to the present invention includes a transparent base material which is made of a transparent polymer substrate; a first thin film which is transparent and is formed by performing physical vapor deposition (PVD) on one surface of the transparent base material; a second thin film which is made of metal and metal oxide and is formed by performing PVD on one surface of the first thin film; and a third thin film which is transparent and is formed by performing PVD on one surface of the second thin film.</p> |
