| 摘要 |
<p>The objective of the present invention is to emit a uniform ultraviolet ray to a substrate surface. An ultraviolet irradiation apparatus (40) includes a wafer holding unit (101), an ultraviolet irradiation chamber (103) which has a light source (102) which emits an ultraviolet ray and a transfer unit (110, 111) through which the wafer holding unit passes (101), an exhaust unit (120) which discharges gas in the ultraviolet irradiation chamber (103) and decompress it, a before-irradiation waiting part (106) which lets the wafer holding unit (101) wait, an after-irradiation retreating part (107) which is installed to the opposite side of the before-irradiation waiting part (106) across the ultraviolet irradiation chamber (103), and a holding unit transferring unit (105) which moves the wafer holding unit (101). The light source (102) is a gauge-rod-shaped lamp which extends in a direction vertical to a direction in which the wafer holding unit (101) moves. The width of the ultraviolet irradiation chamber (103) in the direction vertical to the extended direction of the lamp is narrower than the diameter of a wafer (W).</p> |
