ION BOMBARDMENT TREATMENT DEVICE, AND METHOD FOR CLEANING OF SURFACE OF BASE MATERIAL USING THE TREATMENT DEVICE

摘要

In an ion bombardment treatment apparatus (1A) and a cleaning method, base materials (W) to be treated are held by a work table (11) so as to be placed between a filament (3) and an anode (4) in a vacuum chamber (2), and a discharge power supply (5) which can generate a glow discharge upon the application of a potential difference between the filament (3) and the anode (4) is insulated from the vacuum chamber (2). In the ion bombardment treatment apparatus (lA) and the cleaning method, the efficiency of the cleaning of a base material can be improved and a power supply can be controlled stably.