SALT, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a salt for an acid generator which is used for a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).SOLUTION: The salt is represented by formula (I0). [In the formula (I0), Rrepresents an acid-labile group; Rand Reach independently represent a hydrogen atom or a C1-C6 alkyl group; m and n each independently represent 1 or 2; when m is 2, two Rs are the same or different; when n is 2, two Rs are the same or different; Ar represents an optionally substituted aromatic hydrocarbon group or an optionally substituted heteroaromatic hydrocarbon group; and Arepresents an organic anion.]