发明名称 Packaging Methods and Structures for Semiconductor Devices
摘要 Packaging methods and structures for semiconductor devices are disclosed. In one embodiment, a packaged semiconductor device includes a redistribution layer (RDL) having a first surface and a second surface opposite the first surface. At least one integrated circuit is coupled to the first surface of the RDL, and a plurality of metal bumps is coupled to the second surface of the RDL. A molding compound is disposed over the at least one integrated circuit and the first surface of the RDL.
申请公布号 US2015044819(A1) 申请公布日期 2015.02.12
申请号 US201414523248 申请日期 2014.10.24
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Lin Chih-Wei;Huang Kuei-Wei;Tsai Yu-Peng;Lin Chun-Cheng;Chen Meng-Tse;Yu Chen-Hua;Lii Mirng-Ji;Liu Chung-Shi;Jang Bor-Ping;Lin Hsiu-Jen;Lu Wen-Hsiung;Cheng Ming-Da;Lin Wei-Hung
分类号 H01L25/065;H01L21/52;H01L21/56;H01L25/00;H01L23/00 主分类号 H01L25/065
代理机构 代理人
主权项 1. A method comprising: forming a redistribution layer (RDL) comprising at least one inter-level dielectric (ILD) and at least one first metallization layer formed in the at least one ILD; coupling a first integrated circuit to a first surface of the RDL, the first integrated circuit in electrical contact with first traces of the at least one first metallization layer; forming a first molding compound over the first integrated circuit and the first surface of the RDL, a first surface of the first molding compound disposed above a top surface of the first integrated circuit; forming a second metallization layer having second traces on the first surface of the first molding compound, the second traces in electrical contact with the first traces; coupling a second integrated circuit to the second traces; and forming a second molding compound over the second integrated circuit and in direct contact with a portion of the first surface of the first molding compound.
地址 Hsin-Chu TW