发明名称 APPARATUS AND METHOD FOR FORMING CHALCOGENIDE SEMICONDUCTOR ABSORBER MATERIALS WITH SODIUM IMPURITIES
摘要 A method and system for forming chalcogenide semiconductor absorber materials with sodium impurities is provided. The system includes a sodium vaporizer in which a solid sodium source material is vaporized. The sodium vapor is added to reactant gases and/or annealing gases and directed to a furnace that includes a substrate with a metal precursor material. The precursor material reacts with reactant gases such as S-containing gases and Se-containing gases according to various process sequences. In one embodiment, a selenization operation is followed by an annealing operation and a sulfurization operation and the sodium vapor is caused to react with the metal precursor during at least one of the annealing and the sulfurization steps to produce a chalcogenide semiconductor absorber material that includes sodium dopant impurities.
申请公布号 US2015044814(A1) 申请公布日期 2015.02.12
申请号 US201313962979 申请日期 2013.08.09
申请人 TSMC Solar Ltd. 发明人 WU Chung-Hsien;YEN Wen-Tsai;WU Jyh-Lih
分类号 H01L31/18;C23C16/448;H01L31/0392 主分类号 H01L31/18
代理机构 代理人
主权项 1. A method for forming a chalcogenide semiconductor absorber material, said method comprising: disposing a substrate with metallic precursors disposed thereon, in a furnace; vaporizing sodium to produce a sodium vapor; combining said sodium vapor with an inlet reaction gas stream to produce a gas mixture; delivering said gas mixture to said furnace; and causing said gas mixture to react with said metallic precursors in said furnace to form a chalcogenide semiconductor absorber material with sodium dopants therein.
地址 Taichung City TW