METHODS OF MANUFACTURING THIN-FILM TRANSISTOR ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY

摘要

A method of manufacturing a thin film transistor array substrate includes providing a plurality of gate lines and a plurality of data lines on a first substrate, providing an organic layer on the gate lines and the data lines, providing a first electrode on the organic layer, providing a passivation layer on the first electrode, providing a second electrode on the passivation layer, providing a first cover layer on the second electrode to cover the second electrode, providing a plurality of photosensitive layer patterns on the first cover layer, providing a plurality of first cutout patterns in the first cover layer and a plurality of second cutout patterns in the second electrode using the photosensitive layer patterns as an etch mask, and providing a plurality of third cutout patterns in the passivation layer using the first cover layer as an etch mask.

主权项

1. A method of manufacturing a thin-film transistor array substrate, the method comprising:
providing a plurality of gate lines and a plurality of data lines on a first substrate; providing an organic layer on the gate lines and the data lines; providing a first electrode on the organic layer; providing a passivation layer on the first electrode; providing a second electrode on the passivation layer; providing a first cover layer on the second electrode to cover the second electrode; providing a plurality of first photosensitive layer patterns on the first cover layer; providing a plurality of first cutout patterns in the first cover layer and a plurality of second cutout patterns in the second electrode using the first photosensitive layer patterns as an etch mask; and providing a plurality of third cutout patterns in the passivation layer using the first cover layer as an etch mask.