发明名称 |
NANO-GAP ARTICLES AND METHODS OF MANUFACTURE |
摘要 |
A method for fabricating articles for use in optics, electronics, and plasmonics includes large scale lithography or other patterning and conformal deposition such as by atomic layer deposition. |
申请公布号 |
US2015044428(A1) |
申请公布日期 |
2015.02.12 |
申请号 |
US201414453791 |
申请日期 |
2014.08.07 |
申请人 |
REGENTS OF THE UNIVERSITY OF MINNESOTA |
发明人 |
Oh Sang-Hyun;Chen Xiaoshu |
分类号 |
C23C16/455;G02B1/10;B32B43/00;B32B3/14;B32B37/24;C23C16/06;C23C16/40;G02B5/00;B32B37/00 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
providing a patterned substrate having a substrate layer and a first feature disposed on the substrate, the first feature having a side extending from the substrate layer, wherein the substrate layer is exposed adjacent the side of the first feature; depositing a layer of material by conformal deposition on the first feature and the exposed substrate layer to produce a coated patterned substrate, wherein the side of the first feature is coated with the material at a thickness on a nanoscale or less; and depositing a layer of a metal on the coated patterned substrate such that the metal is deposited on the coated first feature and the coated substrate layer such that the metal is separated from the first feature by the coated material having the nanoscale or less thickness. |
地址 |
Minneapolis MN US |