PAIRED EDGE ALIGNMENT

摘要

Among other things, one or more systems and techniques for scanner alignment sampling are provided. A set of scan region pairs are defined along a periphery of a sampling area associated with a semiconductor wafer. Alignment marks are formed within scan regions of the set of scan region pairs, but are not formed within other regions of the sampling area. In this way, scan region pairs are scanned to determine alignment factors for respective scan region pairs. An alignment for the sampling area, such as layers or masks used to form patterns onto such layers, is determined based upon alignment factors determined for the scan region pairs.

主权项

1. A method for scanner alignment sampling, comprising:
identifying a sampling area associated with a semiconductor wafer, the sampling area comprising a plurality of regions; defining a set of scan region pairs along a periphery of the sampling area; for respective scan region pairs within the set of scan region pairs:
performing a first scan of a first scan region of a first scan region pair to obtain a first scan result;performing a second scan of a second scan region of the first scan region pair to obtain a second scan result;determining a first alignment factor based upon the first scan result and the second scan result; and determining an alignment for the sampling area based upon alignment factors determined for respective scan region pairs.