METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH
摘要
<p>Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.</p>
申请公布号
WO2015020792(A1)
申请公布日期
2015.02.12
申请号
WO2014US47688
申请日期
2014.07.22
申请人
APPLIED MATERIALS, INC.
发明人
OLSEN, CHRISTOPHER S.;GUARINI, THERESA KRAMER;TOBIN, JEFFREY;HAWRYLCHAK, LARA;STONE, PETER;LO, CHI WEI;CHOPRA, SAURABH