| 摘要 |
There is provided a capacitively coupled plasma reactor (10) comprising: a plasma reactor; a capacitive coupling electrode assembly (30) including a plurality of capacitive coupling electrodes (31,33) to induce plasma discharge inside the plasma reactor; a main power supply source (40) to supply radio-frequency power; and a distribution circuit (50) to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes. The capacitively coupled plasma reactor is capable of uniformly generating large-area plasma by a plurality of capacitive coupling electrodes. Furthermore, since a current is automatically in balance when parallel driving a plurality of capacitive coupling electrodes, large-area plasma is more uniformly generated and maintained. |
