发明名称 SEMICONDUCTOR SENSOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To increase the pressure detection sensitivity by reducing the size of a semiconductor pressure sensor.SOLUTION: A deep groove is formed in a thickness direction of a semiconductor substrate. When pressure is applied to a groove adjacent to the groove with part of the groove airtight, a barrier (corresponding to a diaphragm) between the grooves bends, causing the capacity of an airtight space or a groove part to change. By detecting the amount of the change, pressure can be detected. Deepening the groove causes the capacity to increase, thereby allowing a sensor having a smaller area to be created. Furthermore, thinning the barrier allows the amount of change in the barrier to increase, thereby improving the sensor sensitivity.</p>
申请公布号 JP2015028425(A) 申请公布日期 2015.02.12
申请号 JP20130157230 申请日期 2013.07.30
申请人 HOSAKA SHUN 发明人 HOSAKA SHUN
分类号 G01L9/00;B41J2/045;B41J2/055;B41J2/16;F04B43/02;F04B43/04;G01L1/14;G01P15/125;H01G11/22;H01L29/84;H01L41/047;H01L41/09;H01L41/113;H01L41/187;H01L41/193;H01L41/29;H01L41/311;H01L41/333;H04R17/00;H04R19/04 主分类号 G01L9/00
代理机构 代理人
主权项
地址