| 主权项 |
1. A computer-implemented method for detecting defects on a wafer, comprising:
determining local statistics of pixels in output for a wafer generated using an inspection system; determining which of the pixels are outliers based on the local statistics; comparing the outliers to the pixels surrounding the outliers to identify the outliers that do not belong to a cluster of outliers as defect candidates; determining a value for a difference in color between the pixels of the defect candidates and the pixels surrounding the defect candidates; identifying the defect candidates that have a value for the difference in the color that is greater than or equal to a predetermined value as nuisance defects; and identifying the defect candidates that have a value for the difference in the color that is less than the predetermined value as real defects, wherein determining the local statistics, determining which of the pixels are the outliers, comparing the outliers, determining the value for the difference in the color, identifying the defect candidates as the nuisance defects, and identifying the defect candidates as the real defects are performed by a computer system. |
