| 发明名称 |
METHOD FOR MANUFACTURING METAL MASK |
| 摘要 |
A method for manufacturing a metal mask includes defining pattern areas exposing an upper surface, and a lower surface opposite to the upper surface, of a thin plate; and etching the upper and lower surfaces of the thin film plate exposed by the pattern areas, to reduce a thickness of the thin film plate by a predetermined thickness and form deposition openings in the metal mask. The etching the upper and lower surfaces of the thin film plate includes both a wet-etching method and a dry-etching method. |
| 申请公布号 |
US2015040826(A1) |
申请公布日期 |
2015.02.12 |
| 申请号 |
US201414248483 |
申请日期 |
2014.04.09 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
JUNG Sung-Woo;LEE Sang-Yun;KIM Yong-Hwan |
| 分类号 |
C23F1/02;G03F7/30;G03F7/40;B05C21/00 |
主分类号 |
C23F1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing a metal mask, comprising:
defining pattern areas exposing an upper surface, and a lower surface opposite to the upper surface, of a thin plate; and etching the upper and lower surfaces of the thin film plate exposed by the pattern areas, to reduce a thickness of the thin film plate by a predetermined thickness and form deposition openings in the metal mask, wherein the etching the upper and lower surfaces of the thin film plate comprises both a wet-etching method and a dry-etching method. |
| 地址 |
Yongin-City KR |
