| 摘要 |
<p>The present invention provides an antenna unit used for inductance coupling plasma which can perform plasma distribution control for the outer region of a rectangular substrate. In the antenna unit (50), the part of an antenna (13) which forms an induced electric field overall constitutes a rectangular plane corresponding to the rectangular substrate (G), and the antenna (13) has a first antenna portion (13a) and a second line portion (13b) formed by wounding a plurality of antenna wires into a spiral shape. The plurality of antenna wires of the first antenna portion (13a) are disposed to form four corner portions of the rectangular plane, and the four corner portions are combined in different positions of the rectangular plane. The plurality of antenna wires of the second antenna portion (13b) are disposed to form center portions of the four lines of the rectangular plane, and the center portions of the four lines are combined in different positions of the rectangular plane.</p> |
