| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation device in which measurement error caused by charging of the substrate surface can be corrected when measuring the surface position.SOLUTION: A charged particle beam irradiation device for irradiating a substrate with a charged particle beam includes a capacitive sensor and an optical sensor for measuring the surface position of the substrate, a storage section for storing the measured values by the optical sensor and capacitive sensor, and an operating section for obtaining the surface position data of the substrate. The operating section obtains a correction amount by using the measured values of the capacitive sensor and optical sensor in a region within a scribe line on the substrate stored in the storage section, and then obtains the surface position data of the substrate by adapting the correction amount to the measured values by the capacitive sensor.</p> |
