发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT |
摘要 |
PROBLEM TO BE SOLVED: To enhance CE of an EUV (extreme ultraviolet) light generating device.SOLUTION: An extreme ultraviolet light source device may comprise: a laser beam generation system; a laser control system for controlling at least any one of optical intensity and output timing of at least one laser beam output from the laser beam generation system; a chamber having at least one incident port through which the at least one laser beam output from the laser beam generation system is introduced; and a target supply section provided on the chamber and supplying a target substance to a predetermined region in the chamber. |
申请公布号 |
JP2015029116(A) |
申请公布日期 |
2015.02.12 |
申请号 |
JP20140180843 |
申请日期 |
2014.09.05 |
申请人 |
GIGAPHOTON INC |
发明人 |
HORI TSUKASA;KAKIZAKI KOJI;YANAGIDA TATSUYA;WAKABAYASHI OSAMU |
分类号 |
H01S3/14;G03F7/20;H01L21/027;H01S3/0943;H05G2/00 |
主分类号 |
H01S3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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