发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT
摘要 PROBLEM TO BE SOLVED: To enhance CE of an EUV (extreme ultraviolet) light generating device.SOLUTION: An extreme ultraviolet light source device may comprise: a laser beam generation system; a laser control system for controlling at least any one of optical intensity and output timing of at least one laser beam output from the laser beam generation system; a chamber having at least one incident port through which the at least one laser beam output from the laser beam generation system is introduced; and a target supply section provided on the chamber and supplying a target substance to a predetermined region in the chamber.
申请公布号 JP2015029116(A) 申请公布日期 2015.02.12
申请号 JP20140180843 申请日期 2014.09.05
申请人 GIGAPHOTON INC 发明人 HORI TSUKASA;KAKIZAKI KOJI;YANAGIDA TATSUYA;WAKABAYASHI OSAMU
分类号 H01S3/14;G03F7/20;H01L21/027;H01S3/0943;H05G2/00 主分类号 H01S3/14
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