| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately performing exposure processing and measurement processing based on a liquid-immersion method.SOLUTION: An exposure device (EX) forms a liquid-immersion region (AR2) of liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) in the liquid-immersion region (AR2). The exposure device comprises a measurement device (60) for measuring at least any one of a property and a component of the liquid (LQ) for forming the liquid-immersion region (AR2). |
