METHOD OF PRODUCING SUBSTRATE, METHOD OF PRODUCING SUBSTRATE FOR MASK BLANK, METHOD OF PRODUCING MASK BLANK, METHOD OF PRODUCING MASK FOR TRANSFER AND SUBSTRATE PRODUCTION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a substrate which enables production of a substrate low in occurrence of defects and high in smoothness, a method of producing a substrate for a mask blank, a method of producing a mask blank, a method of producing a mask for transfer and a substrate production apparatus.SOLUTION: A method of producing a substrate comprises bringing a processing reference surface of a catalytic substance into contact with the main surface of a substrate composed of a material containing an oxide in a state where a processing fluid intervene between the main surface and the processing reference surface and processing the main surface by catalyst reference etching while causing the main surface and the processing reference surface to move relatively. The processing reference surface is a porous surface, and a catalytic substance is formed on the porous surface.