Patterning Device Support

摘要

In a lithographic apparatus, slippage of a patterning device is substantially eliminated during movement of a patterning device stage by providing a magnetostrictive actuator to apply an accelerating force to the patterning device to compensate for forces that would otherwise tend to cause slippage when the patterning device stage moves.

主权项

1. A patterning device stage system for a lithographic apparatus, comprising:
a stage configured to releasably couple a patterning device to the stage; a stage control system configured to control movement of the stage; and a magnetostrictive control system configured to apply a force to the patterning device.