发明名称 設備
摘要 The invention relates in general level to radiation transference techniques as applied for utilization of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.
申请公布号 JP5666138(B2) 申请公布日期 2015.02.12
申请号 JP20090550738 申请日期 2008.02.22
申请人 ピコデオン・リミテッド・オサケユキテュアPICODEON LTD OY 发明人 ヤリ・ルーットゥ;ヴェサ・ミュッリメキ;レイヨ・ラッパライネン;ラッセ・プッリ;ユハ・メキタロ;サンポ・ユレタロ
分类号 B23K26/08;B23K26/00;B23K26/073;B23K26/36;C23C14/28 主分类号 B23K26/08
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