发明名称 SYSTEM AND METHOD FOR RETURN BEAM METROLOGY WITH OPTICAL SWITCH
摘要 Extreme ultraviolet light (EUV) is produced in a laser- produced plasma (LPP) EUV Sight source when laser light strikes a target. Measuring reflected light from the target by a Return Beam Diagnostics (RBD) module provides data on EUV production, including: but not limited to target position, target focus, target shape, and target profile,. In a RBD.module, a controller sequences an optical switch to direct the reflected light between a blocking element and a sensing device, providing greater flexibility in measuring the reflected light during different aspects of the EUV generation process, such as different power levels and duty cycles of the laser light striking the target.
申请公布号 WO2015019187(A2) 申请公布日期 2015.02.12
申请号 WO2014IB02326 申请日期 2014.07.30
申请人 ASML NETHERLANDS B.V. 发明人 GRAHAM, MATTHEW, R.;BERGSTEDT, ROBERT, A.;CHANG, STEVEN
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