| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a deposition apparatus and method capable of improving the efficiency of deposition with a simple configuration, when generating a thin film on the surface of a workpiece by making an evaporation source discharge in a vacuum container. <P>SOLUTION: The deposition apparatus is provided for generating the thin film on the surface of the surface of the workpiece W by making the evaporation source discharge in the vacuum container 21 and coating the surface of the workpiece W in the vacuum container 21 with charged film material particles emitted from the evaporation source, wherein the cylindrical vacuum container 21 is formed with materials used in the evaporation source. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
