| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a lithography device advantageous for parallely detecting positions of plural marks formed on an original plate. <P>SOLUTION: A lithography device comprises a holding body 4 for holding an original plate 3, on which plural first marks are formed; a stage 1 for holding a reference plate 81, on which a second mark is formed; and a detection system 5 for detecting the respective positions of the plural first marks relative to the second mark. The second mark is formed across a second area having a size larger than a first area, in which the plural first marks on the original plate 3 held by the holding body 4 and a circuit pattern to be transferred are formed. The respective positions of the plural first marks relative to the second mark are parallely detected by the detection system 5. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
