CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing system for processing at least one substrate with plasma.SOLUTION: The plasma processing chamber controls ion energy distribution. The plasma processing system includes: a first electrode 104; a second electrode 106, which is different from the first electrode and configured for bearing a substrate 108; and a signal source 102 coupled with the first electrode. The signal source 102 provides a periodic non-sinusoidal signal through the first electrode in order to control ion energy distribution at the substrate when the substrate is processed.