ANALYSIS DEVICE PROVIDED WITH DISCHARGE IONIZATION CURRENT DETECTOR

摘要

An analysis device comprising a discharge ionization current detector, a plasma gas supply section, a sample gas supply section, a flow rate setting condition holding section and a gas flow rate setting means controller. The flow rate setting condition holding section holds, as a flow rate setting condition, a relationship between a sample gas supply flow rate from the sample gas supply section and a supply flow rate of plasma gas to be set with respect to the sample gas supply flow rate and the gas flow rate controller is configured to set a plasma gas supply flow rate from the plasma gas supply section to a flow rate according to the sample gas supply flow rate, based on the flow rate setting condition held in the flow rate setting condition holding section.

主权项

1. An analysis device comprising:
a discharge ionization current detector including a plasma generation section that generates dielectric-barrier discharge by applying high AC voltage between a plurality of electrodes attached on an outer circumference of a dielectric tube, a sample ionization section that is arranged on a side of one end of the dielectric tube and that ionizes a sample by excitation light emitted at a time of discharge in the plasma generation section, and a sample ion detection section that detects a sample ionized by the sample ionization section as a current; a plasma gas supply section for supplying plasma gas from a side of the other end of the dielectric tube while variably adjusting a flow rate of the plasma gas; a sample gas supply section for supplying sample gas to the sample ionization section from a side opposite the dielectric tube; a flow rate setting condition holding section for holding, as a flow rate setting condition, a relationship between a sample gas supply flow rate from the sample gas supply section and a supply flow rate of plasma gas to be set with respect to the sample gas supply flow rate; and a gas flow rate controller configured to set a plasma gas supply flow rate from the plasma gas supply section to a flow rate according to the sample gas supply flow rate, based on the flow rate setting condition held in the flow rate setting condition holding section.