发明名称 PURGING APPARATUS AND PURGING METHOD FOR SUBSTRATE STORAGE CONTAINER
摘要 Provided is a purging apparatus including an upper nozzle provided above an opening of the substrate storage container and configured to supply a dry gas obliquely downwardly to a side opposite to the substrate storage container and over the entire surface of the width of the opening; and a plurality of side nozzles provided at both sides of the opening of the substrate, respectively, and each configured to supply a dry gas towards the inside of the substrate storage container from an outside of the opening. The side nozzles are each longer than a height of the opening and formed with a plurality of supply holes supplying the dry gas at predetermined intervals in a vertical direction. The respective supply hole formed on one side nozzle and the respective supply holes formed on the other side nozzle are disposed alternately so as not to be located at the same height.
申请公布号 US2015040950(A1) 申请公布日期 2015.02.12
申请号 US201314370306 申请日期 2013.01.30
申请人 TOKYO ELECTRON LIMITED 发明人 Kaise Seiichi;Amemiya Shigeki;Nanasaki Genichi
分类号 B08B9/093 主分类号 B08B9/093
代理机构 代理人
主权项 1. A purging apparatus of purging an inside of a substrate storage container storing a plurality of substrates processed in a substrate processing apparatus vertically in multi-tiers from the outside of the substrate storage container, the purging apparatus comprising: an upper nozzle provided above an opening of the substrate storage container and configured to supply a dry gas obliquely downwardly to a side opposite to the substrate storage container and over the entire surface of the width of the opening; and a plurality of side nozzles provided at both left and right sides of the opening of the substrate storage container, respectively, and each configured to supply a dry gas towards the inside of the substrate storage container from an outside of the opening, wherein the side nozzles are each longer than a height of the opening and formed with a plurality of supply holes supplying the dry gas at predetermined intervals in a vertical direction, and the respective supply holes formed on the side nozzle provided at one side of the opening of the substrate storage container and the respective supply holes formed on the side nozzle provided at the other side are disposed alternately so as not to be located at the same height.
地址 Tokyo JP