发明名称 半導体材料ドーピング
摘要 <p>A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity corresponds to the target band discontinuity.</p>
申请公布号 JP5667206(B2) 申请公布日期 2015.02.12
申请号 JP20120542233 申请日期 2010.12.04
申请人 发明人
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址
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