发明名称 SUBSTRATE PROCESSING SYSTEMS, APPARATUS, AND METHODS WITH FACTORY INTERFACE ENVIRONMENTAL CONTROLS
摘要 Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.
申请公布号 US2015045961(A1) 申请公布日期 2015.02.12
申请号 US201414456631 申请日期 2014.08.11
申请人 Applied Materials, Inc. 发明人 Koshti Sushant S.;Hruzek Dean C.;Majumdar Ayan;Menk John C.;Lee Helder T.;Patil Sangram;Rajaram Sanjay;Baumgarten Douglas
分类号 G05D23/19 主分类号 G05D23/19
代理机构 代理人
主权项 1. An electronic device processing system, comprising: a factory interface including a factory interface chamber; a load lock apparatus coupled to the factory interface; one or more substrate carriers coupled to the factory interface; and an environmental control system coupled to the factory interface and operational to monitor or control one of: a relative humidity,a temperature,an amount of O2, oran amount of an inert gas, within the factory interface chamber.
地址 Santa Clara CA US