NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF

摘要

A negative photosensitive resin composition including an alkali-soluble resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The alkali-soluble resin (A) includes an acrylate resin (A-1) and a novolac resin (A-2). The acrylate resin (A-1) is synthesized by polymerizing a monomer for polymerization, wherein the monomer for polymerization includes an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2). The monomer (a-1-2) includes a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both. The novolac resin (A-2) is synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, wherein the aromatic hydroxy compound includes a xylenol compound.;

主权项

1. A negative photosensitive resin composition, comprising:
an alkali-soluble resin (A); a photoacid generator (B); a basic compound (C); a cross-linking agent (D); and a solvent (E), wherein the alkali-soluble resin (A) comprises an acrylate resin (A-1) and a novolac resin (A-2); the acrylate resin (A-1) being synthesized by polymerizing a monomer for polymerization, the monomer for polymerization comprising an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2), the monomer (a-1-2) comprising a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both, wherein in formula (1), m is an integer of 0 to 2; the novolac resin (A-2) being synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, the aromatic hydroxy compound comprising a xylenol compound.