| 摘要 |
<p>A sample support for high-throughput sample characterization, having an array of samples capable of characterization with an analytical instrument, wherein the support includes at least two position recognition patterns capable of recognition by an analytical method of the analytical instrument and prepared on the sample support together with the sample array, whereby recognition of the recognition patterns by the analytical method enables the determination of the position and orientation of the array in the instrument. The material for the position recognition patterns may be capable of detection by a mass spectrometer, e.g. matrix-assisited laser desorption (MALDI).</p> |
