| 摘要 |
Disclosed is a dielectric barrier discharge plasma reactor (DBD) capable of maintaining a gap between an anode and a cathode by a simple structure. The present invention includes a housing, an anode, a pair of lower holders, a dielectric, a cathode, and a cover. The anode is mounted on the lower side of the housing to cover the chamber, and has orifices capable of injecting a plasma gas. The lower holders faces each other with a gap at both sides of the lower side of the chamber, has a lower installation space therebetween, and has a hole installed to the center of the upper side. The cathode is installed to the installation hole to generate discharge between the cathode and the anode. The cover is mounted on the upper side of the dielectric to cover the installation hole. According to the present invention, a DBD plasma reactor according to the present invention can prevent the failure of a workpiece by making smooth the operation and flow of the plasma gas. For such, a spacer is removed for maintaining a gap between a cathode and an anode by a structure installed in the chamber of a housing supported by lower holders to allow a dielectric installed to the cathode to maintain the gap between the anode and the cathode. |
