| 摘要 |
<p>The present invention relates to a method for manufacturing a retardation film. The method includes preparing a micro structure substrate. The micro structure substrate has convex parts and concave parts which are alternately arranged. The method further includes forming a light orientation layer on the micro structure substrate. Also, the method further includes irradiating the light orientation layer on the light orientation layer by polarized UV. The polarized UV is irradiated with a diffusion angle of 20°-60°substantially with regard to a normal vector of the micro structure substrate to allow the orientation layer to have an uniform orientation angle.</p> |
