| 摘要 |
<p>Provided are a new annealing method which can manufacture block copolymer nanostructures of various patterns in a wafer level within a short time, and a method for manufacturing a nanostructure by using the same. Provided is an annealing method for block copolymer self-assembly which is characterized by comprising the step of immersing a block copolymer in a mixed solvent in which a swelling solvent and a non-swelling solvent are mixed.</p> |
