| 摘要 |
<p>A vaporizer of a deposition apparatus is provided to improve vaporization efficiency and suppress the generation of impurities by supplying completely vaporized raw materials to a process chamber, and to discharge a condensed source material easily by minimizing the volume in an inlet of the vaporizer in which orifices are installed. A vaporizer of a deposition apparatus comprises an injection port(28), a vaporization space, orifices(40), and an exhaust port. The injection port is connected to an inlet. A source material in a liquid state is supplied to the injection port. The vaporization space vaporizes the source material supplied from the injection port. Two or five of the orifices are installed between the injection port and the vaporization space. Each of the orifices has a diameter of 0.1 to 0.5 mm. The exhaust port supplies the source material vaporized in the vaporization space to a process chamber.</p> |
