| 摘要 |
<p>The present invention relates to a thermal treatment device having a separable chamber. In the thermal treatment device of processing a substrate, the thermal treatment device for a substrate includes a front chamber which includes an opening part for loading or unloading a substrate and a front door of closing the opening part, and a back chamber which includes a back door which is combined with the front chamber to close the back part. Therefore, the maintenance and replacement of components installed to the thermal treatment device for a substrate is easily performed.</p> |
