摘要 |
<p>The present invention relates to a method for manufacturing a CIGS solar cell by applying a transparent substrate for solar cell to improve the attachment of a CIGS optical absorption layer and to minimize the effects of plasma on the CIGS optical absorption layer by forming a Cd-free buffer layer by including: a step of primarily forming an AR layer on a substrate to improve optical transmission; a step of forming a TCO layer on the AR layer; a step of forming a Zn-base (ZnX, X = O and S) Cd-free buffer layer on the TCO layer in vacuum; a step of forming a CIGS (Cu-In-Ga-Se) optical absorption layer by forming a CIG layer on the Cd-free buffer layer using a CIG (Cu-In-Ga) target through a sputtering method and forming a Se layer on the top of the CIG layer by using a Se dry type deposition source through a magnetic sputtering method; a step of forming a Mo electrode on the CIGS optical absorption layer; and a step of secondarily forming the AR layer on the opposite side of the substrate on which the CIGS layer is formed.</p> |