发明名称 |
Semiconductor device with contact structure with first/second contacts formed in first/second dielectric layers and method of forming same |
摘要 |
A contact structure includes a first contact formed in a first dielectric layer connecting to the source/drain region of a MOS transistor, and a second contact formed in a second dielectric layer connecting to a gate region of a MOS transistor or to a first contact. A butted contact structure abutting a source/drain region and a gate electrode includes a first contact formed in a first dielectric layer connecting to the source/drain region of a MOS transistor, and a second contact formed in a second dielectric layer with one end resting on the gate electrode and the other end in contact with the first contact. |
申请公布号 |
US8952547(B2) |
申请公布日期 |
2015.02.10 |
申请号 |
US200711775039 |
申请日期 |
2007.07.09 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Liaw Jhon-Jhy |
分类号 |
H01L23/48;H01L23/52;H01L29/40;H01L27/11;H01L23/522;H01L23/528;H01L23/485;H01L27/02 |
主分类号 |
H01L23/48 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A contact structure of a MOS transistor comprising:
a first contact and a second contact formed within and substantially co-planar with a first dielectric layer on a semiconductor substrate, wherein said first contact directly contacts a source region of said MOS transistor and the second contact directly contacts a drain region of said MOS transistor, wherein a first length of the first contact is larger than a first width of the first contact, and wherein a second length of the second contact is larger than a second width of the second contact; a third contact formed within and substantially co-planar with a second dielectric layer formed over the first dielectric layer, said third contact directly contacting said first contact, wherein a third length of the third contact is smaller than a third width of the third contact; a fourth contact formed within and substantially co-planar with the second dielectric layer, said fourth contact directly contacting said second contact, wherein a fourth length of the fourth contact is about equal to a fourth width of the fourth contact; and a fifth contact formed within and substantially co-planar with the second dielectric layer, said fifth contact directly contacting a gate region of said MOS transistor, wherein a fifth length of the fifth contact is about equal to a fifth width of the fifth contact; wherein the lengths of the contacts are in a direction parallel to a channel width direction of the MOS transistor and the widths of the contacts are in a direction perpendicular to the channel width direction of the MOS transistor, wherein the first length of the first contact is larger than the third length of the third contact. |
地址 |
Hsin-Chu TW |